Artikel Ilmiah : K1A015051 a.n. CHERLY FIRDHARINI

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NIMK1A015051
NamamhsCHERLY FIRDHARINI
Judul ArtikelDEGRADASI FENOL DALAM LIMBAH BATIK SOKARAJA MENGGUNAKAN SISTEM FENTON/VISIBLE DENGAN FOTOKATALIS CuO
Abstrak (Bhs. Indonesia)ABSTRAK
Limbah batik merupakan salah satu penyebab pencemaran lingkungan perairan di Indonesia. Salah satu zat yang menyebabkan pencemaran pada limbah batik adalah kandungan fenol didalamnya. Fenol dapat didegradasi melalui metode advanced oxidation processes (AOPs) dengan menggunakan reagen fenton yang didasarkan pada pembentukan radikal hidroksil (•OH). Reagen fenton merupakan campuran dari hidrogen peroksida dan ion ferro yang dihasilkan dari senyawa Ferro sulfat. Produksi radikal hidroksil dapat dimaksimalkan dengan menambahkan sinar tampak pada sistem H2O2/Fe2+ serta penambahan fotokatalis CuO. Selain itu, kondisi pH larutan juga mempengaruhi pembentukan radikal hidroksil. Penelitian ini bertujuan untuk mengetahui pengaruh waktu penyinaran dan penambahan fotokatalis CuO pada degradasi fenol menggunakan reagen fenton. Parameter yang divariasi adalah konsentrasi H2O2, berat FeSO4, waktu penyinaran, berat CuO, dan pH. Hasil penelitian menunjukkan bahwa sinar tampak pada sistem fenton dapat meningkatkan degradasi fenol dalam limbah cair batik. Degradasi fenol pada limbah batik menggunakan sistem fenton/vis dengan fotokatalis CuO sebesar 86,77 % dengan penambahan H2O2 100 ppm, FeSO4 1gram, CuO 1gram dan waktu penyinaran sinar tampak selama 5 jam. Kondisi pH optimum yang diperoleh untuk sistem fenton/vis/CuO adalah pH 3. Laju kinetika reaksi menunjukan orde satu yang menjelaskan bahwa rekasi terjadi antara fenol dan radikal hidroksil. Penambahan scavenger benzokuinon, ammonium oksalat, dan isopropanol secara berturut - turut dapat menghalangi ion superoksida radikal yang dihasilkan oleh CuO, hole (h+) yang dihasilkan oleh CuO, dan radikal hidroksil yang dihasilkan oleh reagen fenton selama proses degradasi yang mengakibatkan penurunan persentase degradasi.
Abtrak (Bhs. Inggris)Batik wastewater is one of the reason of environment pollution in Indonesia. One of the substances that lead to pollution in batik wastewater is the phenol content in it. Phenol can be degraded through advanced oxidation process (AOPs) using a fenton reagent based on hydroxyl radical formation (•OH). Fenton reagent is a mixture of hydrogen peroxide and ferro ions produced from a mixture of Ferro sulfate. Hydroxyl radical production can be maximized by adding visible light to the H2O2 / Fe2+ system and adding CuO photocatalysts. Furthermore, pH of the solution also affects the formation of hydroxyl radicals. This study discusses the time of irradiation and supports CuO photocatalysts on phenol degradation using fenton reagents. The parameters that varied were H2O2 concentration, FeSO4 weight, irradiation time, CuO weight, and pH. The results showed that visible light in the Fenton system increase phenol degradation in batik wastewater. Phenol % degradation in batik wastewater using the fenton/vis system with CuO photocatalyst is 86,77 % by adding 100 ppm H2O2, 1gram FeSO4, 1gram CuO with visible light irradiation for 5 hours. The optimum pH condition obtained for the fenton/vis/CuO system is pH 3. Reactions kinetics rate shows first order which describes the reaction occurring between phenol and hydroxyl radicals. Addition of scavengers such as benzoquinone, ammonium oxalate and isopropanol in a row can block radical superoxide ions produced by CuO, hole (h+) produced by CuO, and hydroxyl radicals produced by fenton reagents during the degradation process which cause a decrease in degradation percentage.Batik wastewater is one of the reason of environment pollution in Indonesia. One of the substances that lead to pollution in batik wastewater is the phenol content in it. Phenol can be degraded through advanced oxidation process (AOPs) using a fenton reagent based on hydroxyl radical formation (•OH). Fenton reagent is a mixture of hydrogen peroxide and ferro ions produced from a mixture of Ferro sulfate. Hydroxyl radical production can be maximized by adding visible light to the H2O2 / Fe2+ system and adding CuO photocatalysts. Furthermore, pH of the solution also affects the formation of hydroxyl radicals. This study discusses the time of irradiation and supports CuO photocatalysts on phenol degradation using fenton reagents. The parameters that varied were H2O2 concentration, FeSO4 weight, irradiation time, CuO weight, and pH. The results showed that visible light in the Fenton system increase phenol degradation in batik wastewater. Phenol % degradation in batik wastewater using the fenton/vis system with CuO photocatalyst is 86,77 % by adding 100 ppm H2O2, 1gram FeSO4, 1gram CuO with visible light irradiation for 5 hours. The optimum pH condition obtained for the fenton/vis/CuO system is pH 3. Reactions kinetics rate shows first order which describes the reaction occurring between phenol and hydroxyl radicals. Addition of scavengers such as benzoquinone, ammonium oxalate and isopropanol in a row can block radical superoxide ions produced by CuO, hole (h+) produced by CuO, and hydroxyl radicals produced by fenton reagents during the degradation process which cause a decrease in degradation percentage.
Kata kuncifenol, limbah batik, Advanced oxidation processes (AOPs), Reagen fenton, dan Fotokatalis.
Pembimbing 1Tien Setyaningtyas, M.Si.
Pembimbing 2Kapti Riyani, M.Si
Pembimbing 3
Tahun2019
Jumlah Halaman85
Tgl. Entri2019-05-13 11:27:33.282732
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